Industry | 2009.10.17
Leti’s Planar-SOI Technology Meets Low-Power, 22nm Node Requirements, Supports Development of “Green” Products
GRENOBLE, France--(BUSINESS WIRE)--Leti, a leading global research center committed to creating and commercializing innovation in micro- and nanotechnologies, today presented results at the SOI Industry Consortium workshop in Leuven, Belgium, that prove SOI-based planar CMOS meets requirements for low-power, 22nm node devices, offering a practical route to further feature shrink and enabling a significant jump for “green” products. With unmatched access resistance and electrostatic c
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