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Technology | 2020.07.14

Festo Lowers Wafer Oxidation Risk with New N2 Purge System

The unit’s piezo-based technology limits the size of abrasion-causing particles to about 0.1 μm.

(PRWeb July 14, 2020)

Read the full story at https://www.prweb.com/releases/festo_lowers_wafer_oxidation_risk_with_new_n2_purge_system/prweb17256390.htm

 

For more information, please visit
https://www.prweb.com/releases/festo_low[...]purge_system/prweb17256390.htm

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