Technology | 2009.09.11
HamaTech APE: MaskTrack Pro® TeraPure System Selected for Nano-Imprint Lithography at Dai Nippon Printing
STERNENFELS, Germany--(BUSINESS WIRE)--HamaTech APE GmbH & Co. KG, today announced that the MaskTrack Pro® TeraPure system has been selected for Nano-Imprint Lithography (NIL) cleaning requirements at DNP, the world\'s leading producer of semiconductor photomasks. Significant developments in cleaning technology and system design distinguish the MaskTrack Pro as the clear choice for Next Generation Lithography, 193i 22nm half pitch (hp) double-patterning (DPT), Extreme Ultraviolet Lithogr
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