Park Systems, world-leader in Atomic Force Microscopes (AFM) announced today they have signed a Joint Development Project (JDP) with nanoelectronics research center imec, to develop in-line AFM metrology solutions of future technology nodes including but not limited to surface roughness, thickness, critical dimension (CD), and sidewall roughness. The JDP will develop new protocol designed to increase production yield and device performance for the semiconductor industry.
(PRWeb February 24, 2015)
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